XPS AES SAM SEM UPS ISS EELS / REELS Depth Profiling RHEED PEEM EBSD
STAIB’s energy analyzer, with its large working distance, used with various sources, provides a powerful choice of electron spectroscopies (AES, XPS, ELS, UPS) and surface conditioning (ion etching, depth profiling, deposition) for the MultiTechTM systems. In addition to the standard combination of AES, XPS, and UPS, expanded systems include a fine focus gun and a detector, providing SEM and SAM. Ion cleaning is typically included, while upgrading to a focused ion source adds depth profiling. Using RHEED and EBSD, structural analysis is available. Several sample manipulation options are available. Customization of systems to match the needs of a lab is typical.
State-of-the-art instrument control and data acquisition packages for spectroscopy, scanning, imaging, gun control, and data export make the system easy to use and integrate. All software is developed using the newest operating systems.
Beyond AES and XPS, the following options are available for the system. Most can be added after delivery without major modification of the system.
Customized systems are available.
||For sample imaging to the resolution of the electron source selected. Used with a Secondary Electron Detector.
||For images from the scanned Auger signal.
|Fine focus electron sources for high spatial resolution studies, especially imaging.
|Provides low resolution image of the sample using the integral e-source. Used to align the instruments onto the sample.
|Using the ion source to clean, Auger data can provide analysis of the material composition.
||UV excitation source is added to provide Ultraviolet Photoemission Spectroscopy (UPS) capability.
||Ion Scattering Spectroscopy (requires modification of the system to add moveable slits and inverted polarity of the power supplies).
||High Energy Electron Diffraction (RHEED) is available by adding an electron source and a fluorescent screen.
||Analyzer for Secondary Electron Yield and distribution studies.