STAIB Instruments is a leading manufacturer of RHEED, AUGER, XPS, UPS, EELS, UHV-SEM, SAM, and of in situ surface analysis and in situ growth monitoring devices.


Reflection High Energy Electron Diffraction, or RHEED, is a powerful technique for studying the structures of crystal samples in a wide variety of research and process chambers.

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Auger / XPS / EELS / REELS

STAIB Instruments offers modern and powerful energy analyzers for a wide variety of standard and custom applications such as, but not limited to  Auger / XPS / EELS / REELS.

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Electron Sources

STAIB Instruments offers state-of-the-art, reliable low-, medium-, and high- energy sources (up to 100 keV) with beam currents and spot sizes to match most applications.

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Ion Sources

STAIB Instruments offers ion sources for cleaning, sputtering and space simulation.

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X-ray Sources

STAIB Instruments offers an X-ray source for Photoelectron Spectroscopy (XPS).

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Energy Analyzers & Imaging Energy Filters

STAIB Instruments offers modern and powerful energy analyzers for a wide variety of standard and custom applications.

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Charged Particle Detectors

STAIB Instruments offers various types of charged particle detectros.

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STAIB Instruments offers novel surface analysis instruments with its state-of-the-art Photo Emission Electron Microscope (PEEM) and award winning Ion-induced Electron Emission Microscope (IEEM)

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UHV-Systems for Surface Analysis

The STAIB MultiTechTM System Plus is a versatile analysis tool for surface studies in industrial, or research environments.

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Packages for Surface Analysis

Sets for Auger Electron Spectroscopy (AES), Photoelectron Spectroscopy (XPS, UPS), Scanning Electron Microscopy (SEM), Scanning Auger Microscopy (SAM), RHEED, Auger in situ or Auger depth profiling, REELS / EELS, and  Secondary-Electron Yield (SEY), Secondary Electron Distribution (SED), and Backscattered Electron Yield analyses.

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Data Acquisition & Instrument Control Software

STAIB Instruments offers data acquisition packages for RHEED, Electron Spectroscopy (AES, XPS, ELS), Scanning Electron Microscopy (SEM), Scanning Auger Microscopy (SAM), as well as controler for electron-, ion-, and X-ray sources.

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